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R. K. BORDOLOI1,* , P. K. MOCHAHARI1, K. C. SARMA2
Thin films have, now-a-days, become an important ingredient of scientific technology and can be regarded as one of the technology driver of the last century. It plays a pivotal role in the development of diverge and challenging frontier such as nanoelectronics, microelectronics, optoelectronics, molecular electronics, quantum electronics and engineering, high temperature super conductivity (HTSC), solar cell technology etc. Thus, the investigation of material surfaces like thin film surface, film uniformity and surface topography, film thickness measurement are considered as an advanced area of study in solid state science and material science. In addition, the number of various defects in thin films is very large as compared to the bulk solid material, and hence a careful control of the quality and nature of the defects in thin films can also control the properties of thin films3. Although various sophisticated characterization techniques such as AFM, STM, SEM, TEM etc. are available nowadays for surface studies, they are costly and not easily available in laboratories. They are also complex to operate and maintain. Thin films are eminently suitable for applications in areas where interactions with surfaces and also absorption only up to very small depths in the materials used are required. Further, dependence of the thin film properties on their thickness, grain size, surface to volume ratio and the defect structure enables one to tailor-make thin films to the desired requirements of their properties, if one has the knowledge of the various parameters influencing the properties and also the ability to control them adequately to the desired accuracy. In addition, just because of their thinness, they can be used in a number of devices and circuits simply, only to save space by miniaturization. As a matter of fact, because of these unique features, thin films find wide application in diverse and varied fields. ....
Optoelectronics, Microholes, Thin film.
R. K. BORDOLOI, P. K. MOCHAHARI, K. C. SARMA, A simplified optoelectronic technique for detection and size measurement of micro-holes in thin films, Optoelectronics and Advanced Materials - Rapid Communications, 5, 7, July 2011, pp.729-731 (2011).
Submitted at: June 27, 2011
Accepted at: July 25, 2011
Optoelectronics and Advanced Materials - Rapid Communications
(2023): 0.5 - 2023 Journal Citation Reports (Clarivate Analytics, 2024)
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