Abstract
Al:ZnO films were deposited on flex
ible transparent polyimide(PI) substrate by magnetron sputtering at different
temperatures(from room temperature to 250 ℃) using ceramic ZnO:Al (3 wt.% Al2O3 ) target without any optimized process.
The PI has a high glass transition temperature more than 250 and high transmittance in the visible spectrum better than
92%.The structural, optical and electrical properties of t he film were investigated. The largest grain size was about 26.2 nm
with a perfect preferential orientation of (002) planes. The lowest resistivity of AZO films deposited at 150 was
2.51×10 3 Ω·cm and average transmittance in the visible spectrum was 74.3%..
Keywords
Flexible transparent substrate, Polyimide, AZO film, Magnetron sputtering, Substrate temperature.
Citation
WEIMIN LI, HUIYING HAO, Al:ZnO films deposited on flexible transparent polyimide substrate by magnetron sputtering at different substrate temperatures, Optoelectronics and Advanced Materials - Rapid Communications, 6, 1-2, January-February 2012, pp.117-120 (2012).
Submitted at: Nov. 24, 2011
Accepted at: Feb. 20, 2012