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Analysis of fabrication tolerance based on uneven thickness of Su8-photo-resist

QING TAO1,2,* , FENGGUANG LUO2,* , JINXING ZHANG2, BINGCHENG MO2, RUI ZHONG2, DANDAN MIAO2, XIAOXING PAN2, QIANLIANG LIANG2

Affiliation

  1. State Key Laboratory of Optical Fiber and Cable Manufacture Technology, Yangtze Optical Fiber and Cable Company Ltd. R&D center, Wuhan 430073, China
  2. Wuhan National Laboratory for Optoelectronics, School of Optoelectronic Science and Engineering, Huazhong University of Science and Technology, Wuhan 430074, China

Abstract

In this paper, we have analyzed the relationship between light propagation performance and uneven thickness of Su8-photo-resist based on EOPCB. Although spinning process is used to even the Su8-photo-resist, the obtained Su8-photo-resist is uneven, which directly affect cross-section shape of core layer. As long as we control h[0,3m] and a,b[0,2m] , light propagation performance does not affected. But, it is easy to actually fabricate EOPCB..

Keywords

Spinning process, EOPCB, Polymer optical waveguide.

Citation

QING TAO, FENGGUANG LUO, JINXING ZHANG, BINGCHENG MO, RUI ZHONG, DANDAN MIAO, XIAOXING PAN, QIANLIANG LIANG, Analysis of fabrication tolerance based on uneven thickness of Su8-photo-resist, Optoelectronics and Advanced Materials - Rapid Communications, 6, 9-10, September-October 2012, pp.797-799 (2012).

Submitted at: May 10, 2012

Accepted at: Sept. 20, 2012