Abstract
Boron is one of the most difficult materials to process because of its high melting and boiling temperature. Thermionic Vacuum Arc (TVA) is an externally heated cathode arc which can be established in high vacuum condition, in vapors of the anode material. The TVA has proved to be a highly efficient method for producing droplet-free plasmas in metal vapors where electron bombardment results in the efficient target heating and subsequent evaporation at the anode, with vaporization temperatures of over 3000 K. In this paper, boron evaporation property before TVA ignition and XPS analyses of boron thin film deposited by TVA are presented..
Keywords
Vacuum arc plasma, TVA, Boron, Material processing.
Citation
TAMER AKAN, ERDINÇ KARAKAŞ, Boron processes using thermionic vacuum arc, Optoelectronics and Advanced Materials - Rapid Communications, 8, 5-6, May-June 2014, pp.480-482 (2014).
Submitted at: April 8, 2013
Accepted at: May 15, 2014