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Characterization on photoelectric property of TiN/Si heterojunction

JIE XING1,* , HUIYING HAO1, ZHIYUAN ZHENG1

Affiliation

  1. School of Materials Science and Technology, China University of Geosciences, Beijing 100083, China

Abstract

Highly-sensitive photovoltaic effect of TiN/Si heterojunction has been reported. The junction exhibited a high photovoltaic sensitivity (PVS) of 57 mV/mW to He-Ne laser illumination when the laser spot was incident onto the Si substrate. The change of Schottky barrier height due to illumination has been discussed. However, when the laser spot was incident on the TiN film surface, the PVS was only 0.71 mV/mW, which was mainly attributed to the low transmittance of TiN film to He-Ne photons. And further, when a UV Hg lamp irradiated the TiN film, the PVS was enhanced much and increased up to 421 mV/mW..

Keywords

Photoelectric, Heterojunction, Schottky barrier.

Citation

JIE XING, HUIYING HAO, ZHIYUAN ZHENG, Characterization on photoelectric property of TiN/Si heterojunction, Optoelectronics and Advanced Materials - Rapid Communications, 5, 11, November 2011, pp.1174-1177 (2011).

Submitted at: May 30, 2011

Accepted at: Nov. 23, 2011