Abstract
Highly-sensitive photovoltaic effect of TiN/Si heterojunction has been reported. The junction exhibited a high photovoltaic sensitivity (PVS) of 57 mV/mW to He-Ne laser illumination when the laser spot was incident onto the Si substrate. The change of Schottky barrier height due to illumination has been discussed. However, when the laser spot was incident on the TiN film surface, the PVS was only 0.71 mV/mW, which was mainly attributed to the low transmittance of TiN film to He-Ne photons. And further, when a UV Hg lamp irradiated the TiN film, the PVS was enhanced much and increased up to 421 mV/mW..
Keywords
Photoelectric, Heterojunction, Schottky barrier.
Citation
JIE XING, HUIYING HAO, ZHIYUAN ZHENG, Characterization on photoelectric property of TiN/Si heterojunction, Optoelectronics and Advanced Materials - Rapid Communications, 5, 11, November 2011, pp.1174-1177 (2011).
Submitted at: May 30, 2011
Accepted at: Nov. 23, 2011