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S. BOYADZHIEV1,2,* , V. LAZAROVA2, M. RASSOVSKA1, I. YORDANOVA1, R. YORDANOV1
This paper reports about the preparation, surface, structural and sorption characterization of as-deposited molybdenum oxide (MoO3) thin films prepared by two different techniques of reactive sputtering. The methods of radio frequency (RF) and direct current (DC) magnetron reactive sputtering were used for deposition of the films. The composition and microstructure of these thin films were studied by X-ray photoelectron spectroscopy (XPS), Raman spectroscopy and X-ray diffraction (XRD). The films’ surface was observed by a high-resolution scanning electron microscopy (HRSEM). To determine the thickness of the films as well as their refractive indices laser ellipsometry was applied. In order to study the sensing properties, films of various thickness and at different deposition rates were deposited on quartz resonators, and the quartz crystal microbalance (QCM) method was used. Applying it we built prototype QCM sensors with MoO3 sensitive films. Even in as-deposited state and without heating the substrates these thin films showed good sensitivity to ammonia at room temperature. They are also being tested for sensitivity to other gases and with future development can be successfully introduced into advanced environment monitoring devices.
Molybdenum oxide, Thin films, Reactive sputtering, Quartz crystal microbalance, Gas sensor.
S. BOYADZHIEV, V. LAZAROVA, M. RASSOVSKA, I. YORDANOVA, R. YORDANOV, Comparison between RF and DC magnetron reactive sputtered molybdenum oxide thin films for gas sensors, Optoelectronics and Advanced Materials - Rapid Communications, 4, 10, October 2010, pp.1485-1488 (2010).
Submitted at: Sept. 6, 2010
Accepted at: Oct. 14, 2010
Optoelectronics and Advanced Materials - Rapid Communications
(2023): 0.5 - 2023 Journal Citation Reports (Clarivate Analytics, 2024)
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