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M. Z. PAKHURUDDIN1,* , K. IBRAHIM1, A. ABDUL AZIZ1
In this paper, the anisotropic nature of tetramethyl ammonium hydroxide (TMAH) etchant solution (without additives) has been exploited to study the effects of various surface texturing conditions towards morphology and surface reflectivity of p-type (100) monocrystalline silicon (Si) substrates for solar cells applications. 2x2 cm2 samples were textured at 90°C in low concentrations TMAH with different weight percentages (3 wt.%, 5 wt.% and 8 wt.%) for 10, 20 and 30 minutes respectively. The morphology of the textured samples was inspected by scanning electron microscope (SEM) and atomic force microscopy (AFM). Resulting surface reflectivity was measured on optical reflectometer. It was observed that TMAH of 5 wt.% with 10 minutes surface texturing process produced the highest density of random pyramids, highest root mean square (RMS) of surface roughness with the lowest surface reflectivity of about 7% (weighted average) within 400-1000 nm region. Higher TMAH wt.% or longer processing time resulted in a smoother wafer surface hence with higher reflectance. The results of SEM, AFM and surface reflectivity were compared to the result of a reference p-type (100) monocrystalline Si substrate (untextured) respectively. The effects of different TMAH surface texturing conditions towards the morphology and surface reflectivity of monocrystalline Si substrates for solar cells applications were subsequently discussed..
Tetramethyl ammonium hydroxide, Surface texturing, Monocrystalline, Solar cells.
M. Z. PAKHURUDDIN, K. IBRAHIM, A. ABDUL AZIZ, Effects of different TMAH texturing conditions towards morphology and surface reflectivity of monocrystalline silicon for solar cells applications, Optoelectronics and Advanced Materials - Rapid Communications, 5, 1, January 2011, pp.16-21 (2011).
Submitted at: Dec. 7, 2010
Accepted at: Jan. 26, 2011
Optoelectronics and Advanced Materials - Rapid Communications
(2023): 0.5 - 2023 Journal Citation Reports (Clarivate Analytics, 2024)
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