Our site saves small pieces of text information (cookies) on your device in order to deliver better content and for statistical purposes. You can disable the usage of cookies by changing the settings of your browser. By browsing our site without changing the browser settings you grant us permission to store that information on your device.
SHIRLEY TIONG PALISOC1, BENJAMIN SIMONE TUASON1, MICHELLE NATIVIDAD1,*
Indium tin oxide (ITO) electrodes were modified by depositing Nafion-[Ru(bpy)3]2+ thin films on the electrode surface via the spin coating technique. Scanning electron microscopy (SEM) was used to study the surface morphology of the thin films. Cyclic voltammetry (CV) was used to determine the transport mechanism and the diffusion coefficient of the redox mediators within the films. Different film thicknesses were fabricated by varying the speeds with which the spin coater thinned out the films. SEM micrographs showed a trend of increasing smoothness with increasing thinning rate. The resulting film thickness can be manipulated by simply varying the speed at which the deposited film is thinned out. CV results show successful incorporation of [Ru(bpy)3]2+ within the films. The order of the magnitude of the diffusion coefficients confirmed that the redox mediators were immobilized within the Nafion thin film..
Nafion, Scanning electron microscopy, Cyclic voltammetry, Spin coating.
SHIRLEY TIONG PALISOC, BENJAMIN SIMONE TUASON, MICHELLE NATIVIDAD, Electrochemical behavior of indium tin oxide electrodes spin coated with Nafion-[Ru(bpy)3]2+ thin films, Optoelectronics and Advanced Materials - Rapid Communications, 9, 11-12, November-December 2015, pp.1435-1439 (2015).
Submitted at: Aug. 25, 2015
Accepted at: Oct. 28, 2015
Optoelectronics and Advanced Materials - Rapid Communications
(2023): 0.5 - 2023 Journal Citation Reports (Clarivate Analytics, 2024)
Active accounts were imported to the new platform and assigned a random password by default. In order to access your account you need to access the login page and go through the Lost Password dialog (involves the system sending you an email with instructions) in order to reset your password. This step is necessary as passwords are kept in hashed form and the new platform uses modern hashing algorithms incompatible with the previous ones.