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J. MIKELSONE1,* , J. TETERIS1, M. REINFELDE1
Azo-epoxy resist is promising material for direct holographic recording due to good photosensitivity and possibility to modify structure of molecule during synthesis – obtained polymer polymerization index easily can be changed by varying curing temperature and curing time. Produced photoresist had properties similar to low-weight molecular glasses. In this work 4-Aminoazobenze, Disperse Orange 2 and epoxy resin bisphenol A diglycidyl ether were used. Surface relief grating formation by direct holographic method was performed in obtained resists. Surface relief grating post-recording self-enhancement process was investigated. It allows to increase a depth of surface relief grating after holographic recording, using physical method – uniform light illumination. It decreases time and required exposure for recording, making holographic recording more effective because grating formation is less affected by vibrations and noises..
Surface relief grating, Holographic recording, Azo-epoxy films.
J. MIKELSONE, J. TETERIS, M. REINFELDE, Enhancement of photosensitivity in azo epoxy resists for direct holographic recording, Optoelectronics and Advanced Materials - Rapid Communications, 13, 11-12, November-December 2019, pp.576-579 (2019).
Submitted at: Aug. 13, 2019
Accepted at: Dec. 10, 2019
Optoelectronics and Advanced Materials - Rapid Communications
(2023): 0.5 - 2023 Journal Citation Reports (Clarivate Analytics, 2024)
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