Abstract
In this paper, we had investigated site control led and low density quantum dots (QDs) required communications band
single photon source on the pattern ed substrate s by molecular beam epitaxy (There were st ill difficulties in isolating
single QD s from the low density QD s assemble. In order to overcome such difficulty, growth of site control led QDs on
pre patterned substrate s w ere proposed and preserve high material quality of the low density QDs for a real single photon,
the In(Ga)As/GaAs QDs grown on the high reflectivity distributed bragg reflector mirror composed of a limited thickness of
the wavelength of the micro cavity center. T he spectrum measured at 10K, and the wavelength was 1.3156μm, width only
was 45μeV, respectively. The results show ed that the site controlle d and low density QDs growth technology would be
prepared not only had high optical quality, but also for communications band 1.3μm single photon emission..
Keywords
Site-controlled, Low-density, Quantum dots, Single-photon, MBE.
Citation
Y. MINGHUI, S. QIXIANG, L. SHIJUN, L. JINGSHENG, Epitaxial g rowth and o ptical p roperties of ultra low density InAs quantum dots on patterned substrate by MBE, Optoelectronics and Advanced Materials - Rapid Communications, 9, 1-2, January-February 2015, pp.36-39 (2015).
Submitted at: Nov. 13, 2014
Accepted at: Jan. 21, 2015