Our site saves small pieces of text information (cookies) on your device in order to deliver better content and for statistical purposes. You can disable the usage of cookies by changing the settings of your browser. By browsing our site without changing the browser settings you grant us permission to store that information on your device.
BO WANG1,* , LI CHEN1, LIANG LEI1, JINYUN ZHOU1
Fused-silica is an excellent optical material for its high optical quality. Gratings etched in fused silica can be widely used in a variety of optical systems. By lithography and inductively coupled plasma etching technology, fused-silica gratings can be fabricated for mass production with low cost. In order to achieve fast etching rate, gas of SF 6 was used to generate main etching ions. A nd optimized dry etching conditions were given, including gas flow rate and two radio frequency sources Experimental results show that the etc hing rate can reach 1.44 m 10 min under optimized etching conditions of SF 6 without polymer deposition..
Grating, Inductively coupled plasma, Fused silica, SF 6.
BO WANG, LI CHEN, LIANG LEI, JINYUN ZHOU, Fast etching of fused silica gratings with inductively coupled plasma by SF 6, Optoelectronics and Advanced Materials - Rapid Communications, 7, 11-12, November-December 2013, pp.1021-1023 (2013).
Submitted at: Nov. 6, 2012
Accepted at: Nov. 7, 2013
Optoelectronics and Advanced Materials - Rapid Communications
(2023): 0.5 - 2023 Journal Citation Reports (Clarivate Analytics, 2024)
Active accounts were imported to the new platform and assigned a random password by default. In order to access your account you need to access the login page and go through the Lost Password dialog (involves the system sending you an email with instructions) in order to reset your password. This step is necessary as passwords are kept in hashed form and the new platform uses modern hashing algorithms incompatible with the previous ones.