Abstract
Two AlGaAs/GaAs quantum well infrared photodetectors (QWIPs) were grown using molecular beam epitaxy (MBE) with continues growth method. One of them has bound-to-bound transition (B-T-B) QWIP and the other has bound-to-continuum transition (B-T-C) QWIP. The structural properties of the QWIPs were characterized by high-resolution x-ray diffraction (HRXRD) and optical properties were characterized by photoluminescence (PL) measurements. Also dark current measurements of the QWIPs were performed at low temperature and show that the B-T-C QWIP has lower dark current level than B-T-B QWIP due to reducing the carrier tunneling..
Keywords
AlGaAs/GaAs QWIP, High resolution x-ray diffraction, Photoluminescence, Dark current.
Citation
H. ALTUNTAS, S. OZCELIK, Growth and characterization of AlGaAs/GaAs quantum well infrared photodetectors, Optoelectronics and Advanced Materials - Rapid Communications, 4, 2, February 2010, pp.132-135 (2010).
Submitted at: May 4, 2009
Accepted at: Feb. 2, 2010