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Improvement of the contact resistance by annealing in organic photovoltaic devices

GUILIN LIU1, YING GUO2, HUIMIN YAN2, JIAQI WU3, WENJIA LI2, XI XI3, YIXIN ZHANG2, GUOHUA LI2,4,*

Affiliation

  1. School of Internet of Things Engineering, Jiangnan University, Wuxi 214122, China
  2. School of Science, Jiangnan University, Wuxi 214122, China
  3. Suntech Power Co., Ltd. Wuxi 214028, China
  4. Jiangsu (Suntech) Institute for Photovoltaic Technology, Wuxi 214028, China

Abstract

The annealing process was used to decrease the contact resistance of organic solar cells, in which Znic Phthalocyanine (ZnPc) was used as the active layer. The contact resistance was significantly improved by using the proper annealing temperature and duration in this experiment. The change of morphology between organic layer and anode was observed after the annealing process. In this study, the contact resistance decreased by 8% for a treatment at 120℃ for 20 minutes compared with that of new prepared samples..

Keywords

Organic solar cells, Annealing process, Contact resistance, Morphology.

Citation

GUILIN LIU, YING GUO, HUIMIN YAN, JIAQI WU, WENJIA LI, XI XI, YIXIN ZHANG, GUOHUA LI, Improvement of the contact resistance by annealing in organic photovoltaic devices, Optoelectronics and Advanced Materials - Rapid Communications, 6, 11-12, November-December 2012, pp.1064-1068 (2012).

Submitted at: May 15, 2012

Accepted at: Oct. 30, 2012