Abstract
Aluminum-doped ZnO (AZO) films are deposited onto the glass substrate by RF magnetron sputtering method. The influence of oxygen concentration in flow sputtering gas on structure and optical properties of AZO are studied. The X-ray diffraction (XRD) shows that the films are highly oriented with their crystallographic c-axis perpendicular to the substrate and that the grain size is influenced by oxygen concentration. The AZO films have high optical transmission in the visible range. The decrease of bandgap energy Eg with increasing oxygen concentration in the flow sputtering gas is described by the Burstein-Moss effect..
Keywords
Al-ZnO films, RF sputtering, XRD, Optical transmission.
Citation
D. GIRBOVAN, D. MARCONI, R. REDAC, A. V. POP, Influence of oxygen on structure and optical properties of AZO films, Optoelectronics and Advanced Materials - Rapid Communications, 6, 9-10, September-October 2012, pp.859-862 (2012).
Submitted at: July 23, 2012
Accepted at: Sept. 20, 2012