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R. DHUNNA1,* , C. LAL1, G. AGARWAL1, I. P. JAIN1
Thin films of transition metal nitrides are interesting systems due to their important properties such as high hardness and chemical inertness. An amorphous iron nitride thin film was deposited onto glass and silicon substrate using reactive ionbeam sputtering of iron in nitrogen atmosphere. The structural and magnetic properties of the film have been studied using grazing incidence x-ray diffraction, x-ray photoelectron spectroscopy, elastic recoil detection analysis, and magneto-optic Kerr-effect measurements. Ion-beam induced effects on thin films were observed using Au ions of 100 MeV energy at 1x1014 ions/cm2 fluence. GIXRD of irradiated thin film samples shows a broad maximum around 2θ ≈ 430 showing no change in the nature of film. The film is found to transform into a mixture of ε- Fe3N and α- Fe phases at 568 K. MOKE results show increase in coercivity after irradiation.
Grazing incidence x-ray diffraction, Nitrides, MOKE.
R. DHUNNA, C. LAL, G. AGARWAL, I. P. JAIN, Ion-beam modifications in Fe-N thin films, Optoelectronics and Advanced Materials - Rapid Communications, 4, 10, October 2010, pp.1489-1492 (2010).
Submitted at: April 10, 2010
Accepted at: Oct. 14, 2010
Optoelectronics and Advanced Materials - Rapid Communications
(2023): 0.5 - 2023 Journal Citation Reports (Clarivate Analytics, 2024)
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