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HAO YINLEI1,* , SHI WEICHENG1, ZHOU QIANG1, YANG JIANYI1, JIANG XIAOQING1, WANG MINGHUA1
A process for selectively buried glass based planar waveguide chip manufacturing is presented, which involves surface channel waveguide forming and subsequent field assisted ion diffusion with aids of wedge shaped masking film Cross section at different portion of channel waveguide is observed with optical microscope, and waveguide transition loss is characterized. Results show that smooth transition has been realized using wedge shaped masking film with slope of 1/100, with transition loss of 2.8dB could be achieved..
Glass, Ion exchange, Waveguide.
HAO YINLEI, SHI WEICHENG, ZHOU QIANG, YANG JIANYI, JIANG XIAOQING, WANG MINGHUA, Manufacturing of selectively buried channel waveguide on glass substrate, Optoelectronics and Advanced Materials - Rapid Communications, 8, 7-8, July-August 2014, pp.668-671 (2014).
Submitted at: Aug. 1, 2011
Accepted at: July 10, 2014
Optoelectronics and Advanced Materials - Rapid Communications
(2023): 0.5 - 2023 Journal Citation Reports (Clarivate Analytics, 2024)
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