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Mode sensitivity analysis of vertically arranged double hybrid plasmonic waveguide

M. A. BUTT1,* , N. L. KAZANSKIY1,2

Affiliation

  1. Department of Technical Cybernetic, Samara National Research University, 34 Moskovkoy e Shosse, Samara 443086, Russia
  2. IPSI RAS Branch of the FSRC "Crystallography and Photonics" RAS, 151 Molodogvar deiskaya, Samara 443001, Russia

Abstract

Herein, we present a numerical investigation of mode sensitivity of a vertically arranged double hybrid plasmonic waveguide structure based on the silicon on insulator platform. The waveguide geometry is composed of a silicon core separated by nanogaps fro m a metal film on both sides. The study is conducted via a 3D finite element method utilizing a commercially available COMSOL software. The width of the silicon core ( W core ) plays an important role in the formation of a pure strong hybrid mode in the low i ndex medium nanogaps. The device height is fixed at 220 nm whereas the W core is optimized to boost the confinement factor and evanescent field ratio which in turn results in enhanced sensitivity of the hybrid mode. The maximum confinement factor, evanescen t field ratio and mode sensitivity of TE polarized hybrid mode are 0.575, 0.695 and 0.938 are obtained at W core =220 nm and g =50 nm , respectively. We believe that our study provides a strategy for the formation of sensitive waveguide structures to be utiliz ed in sensing applications..

Keywords

Hybrid plasmonic waveguide, Mode sensitivity, Finite element method, Evanescent field ratio.

Citation

M. A. BUTT, N. L. KAZANSKIY, Mode sensitivity analysis of vertically arranged double hybrid plasmonic waveguide, Optoelectronics and Advanced Materials - Rapid Communications, 14, 9-10, September-October 2020, pp.385-388 (2020).

Submitted at: June 12, 2020

Accepted at: Oct. 21, 2020