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L. IONEL1, C. P. CRISTESCU2, F. JIPA1, M. ENCULESCU3, M. RADOIU4, R. DABU1, M. ZAMFIRESCU1, M. ULMEANU1,*
The aim of this study is to investigate the influence of the different media, e.g. air, water, CCl4 (carbon tetrachloride) and C2Cl3F3 (tricloro-trifluoro-ethane), when irradiating a Si (100) substrate, with a 200 femtosecond (fs) laser pulses of a Ti:sapphire laser operating at 775 nm. Various micro and nanomorphologies could be achieved by changing the media, the laser pulse energy and the number of pulses. It is shown that the resulting Si (100) surface presents a regulated morphology in air consisting of parallel ripples and the formation of regular arrays of submicrometer spikes on Si (100) in CCl4 and C2Cl2F3, respectively. Irradiation of a Si (100) substrate immersed in water creates a regularly structured surface but it doesn’t facilitate the spikes formation. The potential use of the patterned Si substrates as model scaffolds for the systematic exploration of the role of 3D micro/nano morphology on cell adhesion and growth is envisaged.
Ultra-short laser pulses, Ripples, Submicrometer spikes.
L. IONEL, C. P. CRISTESCU, F. JIPA, M. ENCULESCU, M. RADOIU, R. DABU, M. ZAMFIRESCU, M. ULMEANU, Nano and micro-morphology modifications of Si (100) substrate induced by femtosecond laser pulse irradiations in air, water, CCl4 and C2Cl3F3, Optoelectronics and Advanced Materials - Rapid Communications, 4, 11, November 2010, pp.1920-1924 (2010).
Submitted at: Nov. 12, 2010
Accepted at: Nov. 10, 2010
Optoelectronics and Advanced Materials - Rapid Communications
(2023): 0.5 - 2023 Journal Citation Reports (Clarivate Analytics, 2024)
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