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Nanoscale control of doped organic hole-injection layer in thermally annealed top emission organic light emitting diode

JUNWEI XU1, LEI ZHANG1,* , HUI LIN1, QUAN JIANG1

Affiliation

  1. Key Lab of OLED Science and Technology, Key Lab of Display Science and Technology of Sichuan Province, School of Optoelectronic Information, University of Electronic Science and Technology of China (U

Abstract

Top emission organic light emitting diodes with a maximum luminance approaching 13300cd/m2 and an improved ambient stability is fabricated by applying the thermal annealing at 200℃ in vacuum after the deposition of Aluminum/Nickel-Chromium/4,4′,4″-tris[3-methylphenyl(phenyl)amino]triphenylamine: 2,3,5,6-tetrafluoro-7,7,8,8-tetracy anop -quinodimethane(Al/Ni-Cr/m-MTDATA:F4TCNQ) hole-injection stack structure. The increased luminance and relatively stable performance are attributed to the modification of doped hole-injection material morphology and changes in the metal-organic interface induced by annealing. The thermally optimized surface and nanoscale grain networks provide stronger organic contact, higher electron-hole pairs generation and higher hole mobility compared with surface and bulk morphology of unannealed hole-injection stack structure. Formation of chemical bonds across the metal-organic interface is expected as another explanation of the enhanced hole-injection efficiency..

Keywords

Top emission organic light emitting diodes(TEOLEDs), Thermal annealing in vacuum, Doped hole-injection layer, Surface morphology, Metal-organic interface.

Citation

JUNWEI XU, LEI ZHANG, HUI LIN, QUAN JIANG, Nanoscale control of doped organic hole-injection layer in thermally annealed top emission organic light emitting diode, Optoelectronics and Advanced Materials - Rapid Communications, 7, 11-12, November-December 2013, pp.817-821 (2013).

Submitted at: June 30, 2012

Accepted at: Nov. 7, 2013