Abstract
In this work, we studied optical transmission and electrical conduction properties of micro-scale holy metal (Al) films fabricated on glass substrates using conventional UV lithography and wet etching processes. For the properly etched holy metal films, the measured transmittance in the visible spectrum range is uniformly above 85%, and the effective sheet resistance is in the order of ~1×10-5 Ω⋅cm; somehow they show better figure-of-merit than other typical transparent conducting layers. Additionally considering that the holes are in the micro-scale dimension, such structured metal films can be applied in many optoelectronic devices..
Keywords
Transparent electrode, Metal film, Optical transmission, Conductivity.
Citation
XIAO-LIU ZUO, ZHI-JUN SUN, Optical transmissivity and conductivity of metal films with micro-scale holes for transparent electrodes, Optoelectronics and Advanced Materials - Rapid Communications, 4, 5, May 2010, pp.647-649 (2010).
Submitted at: April 10, 2010
Accepted at: May 20, 2010