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Phononic and optical behavior of reactive-sputtered Cr₂O₃ thin films for infrared optoelectronics

N. ROMCEVIC1, M. CURCIC1,* , J. PESIC1, N. PAUNOVIC1, S. PETROVIC2, U. RALEVIC1, M. ROMCEVIC1, M. GILIC1

Affiliation

  1. Institute of Physics Belgrade, Pregrevica 118, 11080 Belgrade, Serbia
  2. Institute Vinca, P.O. Box 522, 11001 Belgrade, Serbia

Abstract

Cr₂O₃ is a promising semiconducting material for applications in optoelectronics devices, e.g. in novel differential photodetectors. Cr₂O₃ thin films with varying thickness were deposited on glass by reactive magnetron sputtering under different oxygen partial pressures. AFM, Raman and far-infrared (FIR) spectroscopy were used to correlate deposition conditions with film structure and optical response. The FIR reflectivity was interpreted using a film–substrate numerical model, while phonon assignments were supported by first-principles DFT calculations. A distinct surface optical phonon (SOP) mode was identified, underscoring the potential of Cr₂O₃ thin films for infrared optoelectronic and photodetector applications.

Keywords

Cr₂O₃ thin films, Optical coatings, Surface optical phonon, Reactive sputtering, Density functional theory, Far-infrared spectroscopy.

Citation

N. ROMCEVIC, M. CURCIC, J. PESIC, N. PAUNOVIC, S. PETROVIC, U. RALEVIC, M. ROMCEVIC, M. GILIC, Phononic and optical behavior of reactive-sputtered Cr₂O₃ thin films for infrared optoelectronics, Optoelectronics and Advanced Materials - Rapid Communications, 20, 5-6, May-June 2026, pp.249-256 (2026).

Submitted at: Dec. 25, 2025

Accepted at: June 2, 2026