Abstract
High-quality
β
- Ga2O3 film and
β
- Ga2O3/ ZnO/
β
- Ga2O3 film have been prepared by laser molecular beam epitaxy (LMBE) without annealing and their photoelectric characterization has been investigated. These semiconducting films were deposited on sapphire <002> substrate with 700 for photoelectric and microstucture characterization. X-ray diffraction (XRD) showed that β - Ga2O3 and ZnO peak intensity, peak position and Full Width at Half-Maximum (FWHM). X-ray photoelectron spectroscopy (XPS) illustrated the atomic composition (Ga/O) and concentration (2/1.048) of β - Ga2O3/ ZnO/ β - Ga2O3 film surface. Ultraviolet transmittance spectrum (UV) indicated the different transmittance in the same region. Additionally, the bandgap of β - Ga2O3 film and β - Ga2O3/ ZnO/ β - Ga2O3 film were calculated by Tauc’plot method, the bandgap of β - Ga2O3 film was 5.1ev, but the one of β - Ga2O3/ ZnO/ β - Ga2O3 film was 4.8 ev. Room-temperature photoluminescence spectrum (PL) of the as-synthesized β - Ga2O3 film and β - Ga2O3/ ZnO/ β - Ga2O3 film revealed blue (419 nm) and UV (385 nm) emission, respectively. In addition, electrical properties of the films were investigated by Hall Effect investigations..
Keywords
Gallium oxide, Zinc oxide, Transparent, Ultraviolet.
Citation
JINJIN GUO, AIHUA LIU, BAOYUAN MAN, MEI LIU, SHOUZHEN JIANG, JUAN HOU, DEMIN KONG, Photoelectric characterization of the β - Ga2O3 film with ZnO nano-interlayer compared to the β- Ga2O3 films, Optoelectronics and Advanced Materials - Rapid Communications, 5, 9, September 2011, pp.964-968 (2011).
Submitted at: July 29, 2011
Accepted at: Sept. 15, 2011