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Preparation and character of ZnO:Al transparent conductive films deposited on polymer substrates by RF magnetron sputtering

WANG XIAO-JING1,2,* , LI DE-JUN1,2, WANG JUN1

Affiliation

  1. School of electronics and electrical engineering, Wuhan Textile University, Wuhan 430074, China
  2. Hubei PV center of engineering & Technology, Wuhan 430074, China

Abstract

Aluminium doped ZnO (ZnO:Al) films were deposited on polymer substrates by RF magnetron sputtering. The influences of Al-doping concentration and deposition temperature on structure and properties of the films were investigated by X-ray diffractometery, Scanning electronic microscopy, UV-visible spectrophotometer, as well as Four-point Probes System. The results revealed that moderate Al-doping and deposition temperature were helpful to improve the crystal quality and optoelectronic properties of ZnO:Al films. The lowest resistivity of 9.5×10-3 Ωcm and the average transmittance of 76% in the visible region was obtained for the film deposited from ZnO:2wt% Al2O3 target at 75..

Keywords

ZnO: Al, Al-doping concentration, Deposition temperature, Structural properties, Electrical and optical properties.

Citation

WANG XIAO-JING, LI DE-JUN, WANG JUN, Preparation and character of ZnO:Al transparent conductive films deposited on polymer substrates by RF magnetron sputtering, Optoelectronics and Advanced Materials - Rapid Communications, 5, 10, October 2011, pp.1111-1114 (2011).

Submitted at: Aug. 25, 2011

Accepted at: Oct. 20, 2011