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Q F. CHEN1,2, Y. Y. LI1,2, P. Y. YING1,2, T L. WANG1,2, P. ZHANG1,2,* , J. B. WU1,2, M. HUANG1,2, Y. H. FANG1,2, V. LEVCHENKO1,2
DC reactive magnetron sputtering (DC RMS) and RF reactive magnetron sputtering ( RF RMS have been employed to deposit SiOx films under different O2 content. Scanning electron microscopy (SEM) morphology indicates that the films as deposited possess a granular surface According to the spectra, all films have good transmittance in the visible to near infrared region. Nevertheless, in the region close to ultraviolet, the films deposited by RF RMS has better transmittance. The refractive index of the films prepared by DC RMS and RF RMS ranges from 1.43 1.47 and 1.46 1.47 at 800 nm respectively. The d eposition rates of these two methods have similar trend. Anyway , SiO x films with good optical performance could be prepared by these two methods under appropriate oxygen content during depositing..
SiOx films, Reactive magnetron sputtering, Transmission property Refractive index Deposition rate.
Q F. CHEN, Y. Y. LI, P. Y. YING, T L. WANG, P. ZHANG, J. B. WU, M. HUANG, Y. H. FANG, V. LEVCHENKO, Preparation and optical properties of SiOx thin films using different reactive magnetron sputtering technology, Optoelectronics and Advanced Materials - Rapid Communications, 14, 9-10, September-October 2020, pp.427-432 (2020).
Submitted at: Sept. 3, 2019
Accepted at: Oct. 21, 2020
Optoelectronics and Advanced Materials - Rapid Communications
(2022): 0.5 - 2022 Journal Citation Reports (Clarivate Analytics, 2023)
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