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Pure, smooth and dense W films obtained by an anodic arc plasma

C. C. SURDU-BOB1,* , P. M. RACOLTA2, M. BADULESCU1, C. CHIOJDEANU2, N. ARSENE1, C. LOGOFATU3, C. IONESCU2, D. SPOREA1, I. GRUIA4

Affiliation

  1. National Institute for Lasers, Plasma and Radiation Physics, Str. Atomistilor 409, MG-36, Magurele, Jud. Ilfov 077125, Romania
  2. National Institute of Physics and Nuclear Engineering, 407 Atomistilor Str., MG-6, Magurele, jud. Ilfov, Romania
  3. National Institute of Materials Physics, 105 bis Atomistilor Str., MG. 7, jud. Ilfov Romania
  4. University of Bucharest, Faculty of Physics, 405 Atomistilor Str., jud. Ilfov, Romania

Abstract

Tungsten films have a number of important applications. The techniques to produce quality films are very few and most of them use gases as precursors or as buffer. The Thermoionic Vacuum Arc (TVA) plasma is an original technique capable of producing pure, dense and very smooth Tungsten films of thicknesses from nanometers to tens of micrometers with no buffer gas or gas precursors. This paper presents characterisation of Tungsten films obtained by TVA in terms of composition and topography using XRF, XPS and AFM. The films studied are pure and contain a very thin surface oxide of WO3. The influence of water vapors inherently present on the chamber walls to the film surface composition is also presented..

Keywords

Tungstene films, Anodic arc plasma, TVA.

Citation

C. C. SURDU-BOB, P. M. RACOLTA, M. BADULESCU, C. CHIOJDEANU, N. ARSENE, C. LOGOFATU, C. IONESCU, D. SPOREA, I. GRUIA, Pure, smooth and dense W films obtained by an anodic arc plasma, Optoelectronics and Advanced Materials - Rapid Communications, 5, 12, December 2011, pp.1336-1340 (2011).

Submitted at: June 1, 2011

Accepted at: Nov. 24, 2011