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M. BADULESCU1, I. GRUIA2,* , C. SURDU-BOB1, C. IACOB1
In order to obtain technological control in thin film deposition, the understanding of surface-plasma interactions is essential. Apart from the type and flux of the impinging ions/neutral atoms on the surface, the ion energy distribution is an important parameter in studies of surface modification due to plasma. The Thermo ionic Vacuum Arc (TVA) plasma proved to be an important deposition tool of thin metal films and hydrogen-free diamond like carbon (DLC) films. There is though very little work on the understanding of surface phenomena related to film growth by TVA. In this paper, analysis of the energy of the ions arriving at the substrate in TVA plasma ignited in Carbon vapours is presented. An in-house, computer-controlled retarding field analyser (RFA) was used for experimentally determining ion energy distributions (IED) of the Carbon ions arriving at the substrate. The results have shown that the energies of ions arriving at the substrate are as high as hundreds eV in TVA, much higher than in any other type of low temperature plasma. This fact makes TVA a unique thin film deposition tool.
Thermoionic vacuum arc plasma, DLC films, Surface-plasma interaction.
M. BADULESCU, I. GRUIA, C. SURDU-BOB, C. IACOB, Retarding field ion energy analysis of an anodic arc carbon plasma, Optoelectronics and Advanced Materials - Rapid Communications, 3, 12, December 2009, pp.1269-1272 (2009).
Submitted at: Oct. 19, 2009
Accepted at: Nov. 23, 2009
Optoelectronics and Advanced Materials - Rapid Communications
(2023): 0.5 - 2023 Journal Citation Reports (Clarivate Analytics, 2024)
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