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TAO NING1,2,* , ZHIMIN LI1, MAOLIN ZHANG1
The e type electron gun is widely used in electron beam evaporation due to its good evaporation ability. However, it also suffers from the drawbacks of poor focusing and electron beam divergence. In this paper, a deflection system consisting of permanent magnets is established, and the magnetic field is numerically simulated using the boundary element method. Further, e lectron trajectory in the magnetic field is calculated using the Runge Kutta method, supplemented by a discussion on the relationship between the focusing ratio and the magnetic charge density, magnetic pole pitch, initial electron velocit y and incident an gle..
: E type electron gun Deflection system Numerical simulation Electron trajectory.
TAO NING, ZHIMIN LI, MAOLIN ZHANG, Simulation of electron trajectory for E type electron gun in the magnetic focusing & deflection system, Optoelectronics and Advanced Materials - Rapid Communications, 13, 1-2, January-February 2019, pp.87-94 (2019).
Submitted at: May 8, 2018
Accepted at: Feb. 12, 2019
Optoelectronics and Advanced Materials - Rapid Communications
(2023): 0.5 - 2023 Journal Citation Reports (Clarivate Analytics, 2024)
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