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ALI KARPUZ1,* , HAKAN KOCKAR2, MESUT ESIYOK2
A series of FeCl/Cu multilayer thin films was deposited with different thicknesses of Cu layer. The multilayers were sputtered with a two dc magnetrons system. The effect of different thicknesses of Cu layer on the properties of the films was investigated. The Cu content in the films gradually increased from 0 at.% to 47 at.% as the Cu layer thickness was increased from 0 nm to 24 nm. According to crystal structure analysis, the intensities of the peaks which belong to the face centered cubic planes increased with increasing Cu content of the films. Modest and mirror-like surfaces were observed in all images obtained by a scanning electron microscope. Magnetic measurements indicated that magnetization decreased with increasing Cu contents in the multilayer thin films. The magnetization of the film without Cu was 1473 emu/cm3 while the value of 348 emu/cm3 was detected for the film with 24 nm Cu layer thickness..
FeCl/Cu, Multilayer thin films, Structural analysis, Magnetic properties.
ALI KARPUZ, HAKAN KOCKAR, MESUT ESIYOK, Sputtered FeCl/Cu multilayer thin films: effect of different thicknesses of Cu layer, Optoelectronics and Advanced Materials - Rapid Communications, 8, 11-12, November-December 2014, pp.1100-1103 (2014).
Submitted at: Dec. 4, 2013
Accepted at: Nov. 13, 2014
Optoelectronics and Advanced Materials - Rapid Communications
(2023): 0.5 - 2023 Journal Citation Reports (Clarivate Analytics, 2024)
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