Abstract
Structural and optical properties of ZnO films, grown on Si(111) and prepared via two-step method by MOCVD using
diethylzinc and H2O as reactant gases, are studied using XRD, PL and AFM. For samples using two-step method, excellent
crystallization quality and optical properties were obtained. Moreover, as increasing the growth temperature, the properties of
ZnO films were improved further. AFM results indicated that the RMS of ZnO films using two-step method were all about 7.0
nm. Compared with the samples using single-step method, there is no obviously variation of RMS as increased the growth
temperature for samples grown by two-step method..
Keywords
ZnO, MOCVD, Two-step methords.
Citation
JIANFENG SU, QIANG NIU, CHUNJUAN TANG, YONGSHENG ZHANG, ZHUXI FU, Structural and optical properties of ZnO films grown by two-step method using MOCVD, Optoelectronics and Advanced Materials - Rapid Communications, 5, 7, July 2011, pp.751-754 (2011).
Submitted at: June 24, 2011
Accepted at: July 25, 2011