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Structural and optical properties of ZnO films grown by two-step method using MOCVD

JIANFENG SU1,* , QIANG NIU1, CHUNJUAN TANG1, YONGSHENG ZHANG1, ZHUXI FU2

Affiliation

  1. Department of mathematics and Physics, Luoyang institute of science and technology, Luoyang 471023, China
  2. Department of Physics, University of Science and Technology of China, Hefei, 230026, China

Abstract

Structural and optical properties of ZnO films, grown on Si(111) and prepared via two-step method by MOCVD using diethylzinc and H2O as reactant gases, are studied using XRD, PL and AFM. For samples using two-step method, excellent crystallization quality and optical properties were obtained. Moreover, as increasing the growth temperature, the properties of ZnO films were improved further. AFM results indicated that the RMS of ZnO films using two-step method were all about 7.0 nm. Compared with the samples using single-step method, there is no obviously variation of RMS as increased the growth temperature for samples grown by two-step method..

Keywords

ZnO, MOCVD, Two-step methords.

Citation

JIANFENG SU, QIANG NIU, CHUNJUAN TANG, YONGSHENG ZHANG, ZHUXI FU, Structural and optical properties of ZnO films grown by two-step method using MOCVD, Optoelectronics and Advanced Materials - Rapid Communications, 5, 7, July 2011, pp.751-754 (2011).

Submitted at: June 24, 2011

Accepted at: July 25, 2011