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B. ZHAO1, J. ZHOU1,* , Y. CHEN1, Y. PENG1
A new glancing angle deposition method was presented for fabricating TiO2 films with engineered refractive index and low light absorption. With rotation of the substrate along the flux direction, the films possess small grain size and small nanorod diameter. The decrease of the grain size increases the optical transmittance in the visible light region, while the decrease of the nanorod diameter increases the optical transmittance in the ultraviolet region. The refractive index of the film decreases from 2.53 to 1.81 while the flux angle increases from 0° to 80°. This controllable refractive index allows the realization of grade-index profile.
Magnetron sputtering, Angle deposition, Titanium dioxide, Antireflection, Optical properties.
B. ZHAO, J. ZHOU, Y. CHEN, Y. PENG, Structure and optical properties of TiO2 thin films prepared by glancing angle deposition, Optoelectronics and Advanced Materials - Rapid Communications, 4, 12, December 2010, pp.1990-1993 (2010).
Submitted at: Nov. 17, 2010
Accepted at: Nov. 29, 2010
Optoelectronics and Advanced Materials - Rapid Communications
(2023): 0.5 - 2023 Journal Citation Reports (Clarivate Analytics, 2024)
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