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LINHUA XU1,* , GAIGE ZHENG1, FENGLIN XIAN1, JING SU1, WEI FENG RAO1
In this work, the photocatalyst of Zn O/Ag multi layered film containing a layer of Ag and several layers of ZnO was prepared by multi spin coating and magnetron sputtering and the effect of the thickness of ZnO layer s on the photocatalytic performance of the multi layered films was investigated The results of X ray diffraction (XRD) showed that the Ag layer was a face centered c ubic structure and the ZnO film crystallized into a wurtzite phase. With the rise of ZnO film t hickness, the crystall ine quality of the ZnO film was improved and the grains also grew up . The photocatalytic tests on methylene blue (MB) showed that the photocatalytic p erformance of the multi layered films was largely enhanced in comparison with pure Z nO thin films and the sample containing 6 layers of ZnO exhibited the best photocatalytic activity in all samples. When the thickness of the ZnO film was relatively thin, its crystalline quality was poor and the quantity of photogenerate d electron hole pai rs was small. There were m any defects including oxygen vacancy in ZnO especially for the region close to the Ag layer, which led to a strong visible emission. When the thickness of the Zn O thin film was more than 6 layers, the photogenerated electrons in Z nO were greatly increased, but most of them were not able to effectively migrate into the Ag layer in a short time, leading to a decrease of the separation efficiency of electron hole pairs. Therefore, selecting a suitable thickness of the ZnO film is very important for obtaining the be st photocatalytic performance for ZnO/Ag multi layered thin films..
ZnO /Ag multi-layered thin films, Thickness effect, Photocatalytic activity, Sol-gel method, Photo luminescence.
LINHUA XU, GAIGE ZHENG, FENGLIN XIAN, JING SU, WEI FENG RAO, T he photocatalytic performance of ZnO /Ag multi layered films: the effect of ZnO layer thickness, Optoelectronics and Advanced Materials - Rapid Communications, 11, 5-6, May-June 2017, pp.381-384 (2017).
Submitted at: March 19, 2016
Accepted at: June 7, 2017
Optoelectronics and Advanced Materials - Rapid Communications
(2023): 0.5 - 2023 Journal Citation Reports (Clarivate Analytics, 2024)
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