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The electrical and vibrational characteristics of ZnO synthesized using the “bottom-up” growth method

S. S. TNEH1,* , Z. HASSAN1, K. G. SAW2, F. K. YAM1, H. ABU HASSAN1

Affiliation

  1. Nano-optoelectronics Research and Technology Laboratory, School of Physics, Universiti Sains Malaysia,11800 Penang, Malaysia
  2. Physics Section, School of Distance Education, Universiti Sains Malaysia, 11800 Penang, Malaysia

Abstract

ZnO thin films were synthesized using the “bottom-up” method. The surface morphology of the ZnO films was determined by using atomic force microscopy. The resistivity was characterized by four point probe measurement. From Raman scattering measurement, the peak A1(LO) at 576 cm-1 is absent for sample with longer oxidation duration, which may be due to the interstitial Zn in the ZnO crystal. Infrared absorbance analysis suggested the presence of Zn −OH bond in the translation and deformation mode in the range of 510-570 cm-1 and 950-1020 cm-1 respectively.

Keywords

ZnO, Thin films, Raman measurement, Infrared spectroscopy, Resistivity.

Citation

S. S. TNEH, Z. HASSAN, K. G. SAW, F. K. YAM, H. ABU HASSAN, The electrical and vibrational characteristics of ZnO synthesized using the “bottom-up” growth method, Optoelectronics and Advanced Materials - Rapid Communications, 4, 12, December 2010, pp.2068-2071 (2010).

Submitted at: Aug. 28, 2010

Accepted at: Nov. 29, 2010