"

Cookies ussage consent

I agree.

Our site saves small pieces of text information (cookies) on your device in order to deliver better content and for statistical purposes. You can disable the usage of cookies by changing the settings of your browser. By browsing our site without changing the browser settings you grant us permission to store that information on your device.

Thickness dependence of microstructure s and optical properties of Mn 1.56 Co 0.96 Ni 0.48 O 4 thin films

CHAO MA1,* , WEI REN2, LEI WANG3

Affiliation

  1. College of Electronic Engineering, Chengdu Technological Un iversity, Chengdu 611730, China
  2. School of Science, Xi an University of Posts and Telecommunications, Xi an 710121, China
  3. School of Environmental Science & Engineering, Shanghai Jiao Tong University, Sha nghai 200240, China

Abstract

Mn 1.56 Co 0.96 Ni 0.48 O 4 (MCN) thin films with different thickness es were synthesized on Si substrates by the chemical solution deposition method. M icrostructure s of the thin films w ere determin ed by atomic force microscop y T he ion by ion growth mechanism was the main reason for t he grain size increase d with the increasing film thickness . T he refractive indices and extinction coefficient s of MCN thin films were determined by measuring ellipsometry parameters and model ed through the Tauc Lorentz os cillator dispersion formula in the wavelength range of 280 850 nm T he optical constants n and k of MCN thin films were found to decrease with increasing thickness due to the variation s in microstructures.

Keywords

T hin film, T hickness dependence Microstructure, O ptical propert y.

Citation

CHAO MA, WEI REN, LEI WANG, Thickness dependence of microstructure s and optical properties of Mn 1.56 Co 0.96 Ni 0.48 O 4 thin films, Optoelectronics and Advanced Materials - Rapid Communications, 13, 1-2, January-February 2019, pp.104-110 (2019).

Submitted at: July 29, 2019

Accepted at: Feb. 12, 2019