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F. HU1, F. CHEN1,* , G. WAMG1, S. NIU1, C. HUANG1
In this paper, to realize triple-band perfect absorption, we present a numerical study of plasmonic absorption based on a metal-dielectric multilayer structure. The structure consists of cross-shaped plasmonic nanohole arrays with a silicon substrate. Results show that three absorption peaks (733 nm, 877 nm and 1340 nm) with the absorption of 95.2%, 99.5%, and 99.2% have been achieved, respectively. The perfect absorption peaks are caused by the localized surface plasmon resonance, Fabry Perot resonance and resonance of SPPs in the nanohole. The effect of structural parameters on absorption and field distribution is presented to illustrate the absorption mechanism. Moreover, the proposed absorber shows excellent angle tolerance approaching ±60°. As for refractive index sensor, the sensitivity is 728 nm/RIU, 425 nm/RIU and 398 nm/RIU, respectively. The results will pave the way towards the design of a multiple band plasmonic perfect absorber, which may have potential application in plasmonic absorption switch, plasmonic sensors and modulators.
Surface plasmon polariton, Plasmonic perfect absorber, Optical absorption, Metal-dielectric multilayer.
F. HU, F. CHEN, G. WAMG, S. NIU, C. HUANG, Triple band perfect absorber based on the metal-dielectric multilayer structure with cross-shaped plasmonic nanohole arrays, Optoelectronics and Advanced Materials - Rapid Communications, 16, 1-2, January-February 2022, pp.47-53 (2022).
Submitted at: Nov. 12, 2020
Accepted at: Feb. 10, 2022
Optoelectronics and Advanced Materials - Rapid Communications
(2023): 0.5 - 2023 Journal Citation Reports (Clarivate Analytics, 2024)
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