Abstract
A plasma
dielectric p lasma (PDP) waveguide structure consisting of a bus waveguide, a stub cavity, and a U shaped
coupling cavity is designed, and the two dime nsional finite difference time domain (FDTD) method is adopted for simulation.
Transmission spectra show that the stub cavity structure corresponds to a continuous spectrum, the coupling cavity structure
corresponds to a discrete state, and the coupling of the two resonators can produce a significant Fano resonance. Magnetic
field distribution confirms that energy localization and destructive interference determine the transmission dips, while
dual cavity coupling enhances transmission at the Fano peak. The geometric parameters of the structure (coupling cavity
side length, stub cavity length, and cavity spacing) can effectively regulate the position, transmittance, and line shape of the
Fano resonance. In the present work, a Fano interference model is const ructed to fit the transmission spectra, and the
theoretical calculation results are in excellent consistency with the FDTD simulation results. In the frequency band of 0.3 1.3
GHz, the dielectric constant of the gaseous discharge plasma is determined by th e plasma frequency, thus enabling the PDP
structure to break the limitation that traditional waveguides cannot be dynamically modulated after fabrication. Dynamic
tuning of the resonance frequency and transmittance can be realized by changing the plasma el ectron density. In this work,
the designed PDP structure can be prepared using electron beam lithography (EBL), focused ion beam (FIB) lithography,
and nano imprinting technology. This provides a feasible solution for dynamic tunable plasma devices in the microwave
frequency band..
Keywords
PDP, Fano resonance, Plasma , FDTD, Nanoimprinting technology.
Citation
Z. DUN, B. LIU, F C HEN, Tunable Fano resonance based on plasma dielectric plasma waveguide coupled resonator system, Optoelectronics and Advanced Materials - Rapid Communications, 20, 7-8, July-August 2026, pp.329-337 (2026).
Submitted at: March 19, 2026
Accepted at: Aug. 3, 2026